基于大颗粒碲化镉薄膜的光电二极管光电注入放大

A. Uteniyazov, K. Ismailov, A. Muratov, B. K. Dauletmuratov, A. Kamalov
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引用次数: 0

摘要

本文介绍了Al-Al2O3-p-CdTe-Mo结构在正向高偏置电压下光电注入放大的研究结果。结果表明,在λ = 450 nm、V = 7 V的“自身”光照射下,二极管的光谱灵敏度达到最大值,λ = 8.4∙104 A/W;在相同偏置电压下,在λ = 950 nm的“杂质”光照射下,二极管的光谱灵敏度达到最大值,λ = 4.3∙104 A/W。确定了用“自身”光照射结构时实现了正反馈机制,用“杂质”光照射结构时实现了参数放大机制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Amplification of photoelectric injection in the photodiode based on large-grain cadmium telluride films
The results of studies of photoelectric injection amplification in the Al–Al2O3–p-CdTe–Mo structure at high bias voltages for the forward current are presented. It has been shown that the spectral sensitivity reaches its maximum value Sλ = 8.4∙104 A/W, when the diode is illuminated with the “own” light at λ = 450 nm and V = 7 V, while when it is illuminated with the “impurity” light at λ = 950 nm Sλ = 4.3∙104 A/W under the same bias voltage. It has been established that when illuminating the structure with the “own” light, the positive feedback mechanism is realized, and when illuminating with “impurity” light, the parametric amplification mechanism is realized.
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