三甲基硅烷流速对光纤温度传感器用SiC薄膜生长的影响

L. Cheng, A. Steckl, J. Scofield
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引用次数: 7

摘要

研究了三甲基硅烷([(CH/sub 3/)/sub 3/SiH]或3MS)流速对光纤温度传感器用单晶蓝宝石衬底上SiC薄膜生长的影响。SiC膜厚度在2-3 /spl mu/m范围内。3MS流动速率的变化影响了SiC薄膜的结构性能。这反过来又改变了传感器的光学特性和温度传感性能。SiC薄膜Fabry-Pe/spl急性/rot干涉仪的光学反射在所有测量样品上都显示出谐振最小值的单向相移。对谐振最小值(660至710 nm)与温度的线性拟合提供了相应的热膨胀系数/spl kappa//sub /spl phi//,为1.7-1.9/spl乘以/10/sup -5/ spl度/C。在优化的3MS流量下,SiC温度传感器在22至540/spl℃范围内的温度精度为/spl plusmn/2.8/spl℃。SiC传感器在532/spl°C下持续两周的短期稳定性显示出非常小的标准偏差0.97/spl°C。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of trimethylsilane flow rate on the growth of SiC thin-films for fiber-optic temperature sensors
We have investigated the effect of trimethylsilane ([(CH/sub 3/)/sub 3/SiH] or 3MS) flow rate on the growth of SiC thin-film on single-crystal sapphire substrate for fiber-optic temperature sensor. The SiC film thickness was in the range of 2-3 /spl mu/m. The variation of the 3MS flow rate affected the structural properties of the SiC films. This, in turn, changed the optical properties and temperature sensing performance of the sensors. Optical reflection from the SiC thin-film Fabry-Pe/spl acute/rot interferometers showed one-way phase shifts in resonant minima on all measured samples. Linear fits to the resonant minima (at 660 to 710 nm) versus temperature provide the corresponding thermal expansion coefficient, /spl kappa//sub /spl phi//, of 1.7-1.9/spl times/10/sup -5///spl deg/C. With the optimized 3MS flow rate, the SiC temperature sensor exhibits a temperature accuracy of /spl plusmn/2.8/spl deg/C from 22 to 540/spl deg/C. The short-term SiC sensor stability at 532/spl deg/C for two weeks shows a very small standard deviation of 0.97/spl deg/C.
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