一种条纹场整形CMOS电容成像阵列

Kangping Hu, Christopher E. Arcadia, J. Rosenstein
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引用次数: 2

摘要

虽然经典的电化学阻抗谱(EIS)侧重于单个工作电极的测量,但密集的有源微电极阵列为新的传感模式提供了机会。本文介绍了一种集成传感器阵列的电化学成像实验结果。该系统采用100 × 100定制CMOS电极阵列,像素为10 μ m × 10 μ m,可测量频率高达100 MHz的阻抗。该传感器芯片的独特设计是利用附近像素组之间的静电耦合来重新塑造局部电场。多偏置电压和时钟相位创造了新型的信号多样性,这将增强计算成像和阻抗断层扫描的传感模式。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A Fringe Field Shaping CMOS Capacitive Imaging Array
While classical electrochemical impedance spectroscopy (EIS) focuses on measurements from a single working electrode, dense active microelectrode arrays offer opportunities for new modes of sensing. Here we present experimental results with an integrated sensor array for electrochemical imaging. The system uses a 100 × 100 custom CMOS electrode array with 10 µm × 10 µm pixels, which measures impedance at frequencies up to 100 MHz. The sensor chip is uniquely designed to take advantage of the electrostatic coupling between groups of nearby pixels to re-shape the local electric field. Multiple bias voltages and clock phases create new types of signal diversity that will enable enhanced sensing modes for computational imaging and impedance tomography.
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