双浸镀ZnAl2O4薄膜的退火效果

R. Chandramohan, V. Dhanasekaran, K. Sundaram, T. Mahalingam
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引用次数: 0

摘要

采用化学溶液浸镀法制备了ZnAl2O4薄膜。研究并报道了热处理后对ZnAl2O4薄膜结构和光学性能的影响。x射线衍射图显示薄膜为ZnAl2O4的多晶立方结构。计算了ZnAl2O4薄膜的显微组织性能,发现随着退火温度的升高,晶粒尺寸有增大的趋势。对纹理系数进行了评估,发现其大于1,显示了薄膜结构的高度纹理化。光学带隙值在3.48 ~ 3.62 eV之间。n和k随退火后温度的升高而降低。扫描电镜显示了均匀分布的球形颗粒。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Annealing effect of double dip coated ZnAl2O4 thin films
Thin films of ZnAl2O4 were prepared by dip technique involving chemical solutions. Investigations on the effect of post heat treatment on the structural, optical properties of ZnAl2O4 thin films were studied and reported. Xray diffraction patterns revealed that the thin films are polycrystalline cubic structure of ZnAl2O4. The microstructural properties of ZnAl2O4 thin films were calculated and crystallite size tends to increase with increase of annealing temperatures. The texture coefficients have been evaluated and found to be greater than unity revealing high texturing of the architecture of the film. The optical band gap values were found to be in the range of 3.48 – 3.62 eV. The n and k were found to decrease with increase of post annealing temperature. The SEM revealed the uniform distribution of spherical grains.
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