二氧化硅与碳反应生成碳化硅的机理

IF 2.1 4区 化学 Q3 CHEMISTRY, PHYSICAL
B. Abolpour, R. Shamsoddini
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引用次数: 14

摘要

用热力学概念研究了二氧化硅的碳还原反应动力学,并用热重仪在1566 ~ 1933 K的温度范围内对该还原反应的实验数据进行了拟合。结果表明,在此还原过程中,生成SiC的唯一途径是Si、SiO或SiO2在碳颗粒表面的反应或SiO在碳颗粒内部的扩散,而CO和CO2对该过程没有直接影响。在低于1750 K的温度下,碳颗粒表面的化学气固或固固反应是这一还原的控制步骤,而在较高温度下,碳颗粒内部SiO的扩散速度控制着这一还原的速度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Mechanism of reaction of silica and carbon for producing silicon carbide
The reaction kinetics of carbon reduction of silica were investigated using thermodynamic concepts and by fitting to relevant models the experimental data obtained for this reduction using a thermogravimetric unit in the temperature range of 1566 to 1933 K. The results show that the only way to produce SiC in this reduction is the reaction of Si, SiO, or SiO2 at the surface or by diffusion of SiO inside the carbon particles while CO and CO2 have no direct effect on the process. The controlling step of this reduction at temperatures lower than 1750 K is the chemical gas–solid or solid–solid reaction at the surface of the carbon particles, while at higher temperatures, the rate of SiO diffusing inside the carbon particles controls the rate of this reduction.
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来源期刊
CiteScore
2.10
自引率
0.00%
发文量
5
审稿时长
2.3 months
期刊介绍: The journal covers the fields of kinetics and mechanisms of chemical processes in the gas phase and solution of both simple and complex systems.
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