太比特级高密度应用银离子存储电池技术

S. Fujii, R. Ichihara, T. Konno, M. Yamaguchi, Harumi Seki, Hiroki Tanaka, Dandan Zhao, Y. Yoshimura, M. Saitoh, M. Koyama
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引用次数: 7

摘要

我们展示了一种由$\text{sub}-\mu \text{a}$、无选择器操作和10年数据保留组成的40nm Ag离子存储单元组成的交叉点存储阵列,使其成为太比特级高密度存储应用的有希望的候选人。具有大而致密的银团簇的不连续导电路径即使在亚μ a电流下也能保持10年,并且在I-V电压下保持高非线性。我们首次将改进的cell实现为40nm的交叉点阵列,并证明了狭窄的读取分布,满足了阵列可靠运行的要求。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Ag Ionic Memory Cell Technology for Terabit-Scale High-Density Application
We demonstrated a cross-point memory array composed of 40nm Ag ionic memory cell with $\text{sub}-\mu \text{A}$ and selectorless operation and 10-year data retention, making it a promising candidate for terabit-scale high-density memory application. Discontinuous conductive path with large and dense Ag clusters enabled 10-year retention even at sub-μA current with keeping high non-linearity in I-V. We implemented, for the first time, the improved cell into a 40nm cross-point array and demonstrated narrow read distribution which satisfies requirements for reliable array operation.
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