{"title":"重复氧化和hf刻蚀后共植入硅片的全反射x射线荧光分析","authors":"R. Klockenkämper, A. Bohlen","doi":"10.1039/A809804B","DOIUrl":null,"url":null,"abstract":"A new method of depth profiling has been developed and applied to a Co-implanted Si-wafer. A square section of only some cm2 was chosen, a thin near-surface sublayer oxidized by an oxygen plasma and the oxidized sublayer precisely etched by a solution of hydrofluoric acid. The mass of Si within the sublayer was determined via differential weighing of the wafer piece and the mass of Co determined by TXRF (total reflection X-ray fluorescence) of the loaded acidic solution. These steps were repeated time and again in order to record a total depth profile showing the relative concentration of Co dependent on the depth within the wafer. The integration of this profile gave a total dose of 1.13 × 1017 ions cm–2 with high accuracy. The depth resolution of the new method might be in the order of a few nm, the detection limit about 0.01% or 5 × 1018 atoms cm–3 of Co.","PeriodicalId":7814,"journal":{"name":"Analytical Communications","volume":"178 1","pages":"27-29"},"PeriodicalIF":0.0000,"publicationDate":"1999-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"13","resultStr":"{\"title\":\"Depth profiling of a Co-implanted silicon wafer by total-reflection X-ray fluorescence analysis after repeated oxidation and HF-etching\",\"authors\":\"R. Klockenkämper, A. Bohlen\",\"doi\":\"10.1039/A809804B\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A new method of depth profiling has been developed and applied to a Co-implanted Si-wafer. A square section of only some cm2 was chosen, a thin near-surface sublayer oxidized by an oxygen plasma and the oxidized sublayer precisely etched by a solution of hydrofluoric acid. The mass of Si within the sublayer was determined via differential weighing of the wafer piece and the mass of Co determined by TXRF (total reflection X-ray fluorescence) of the loaded acidic solution. These steps were repeated time and again in order to record a total depth profile showing the relative concentration of Co dependent on the depth within the wafer. The integration of this profile gave a total dose of 1.13 × 1017 ions cm–2 with high accuracy. The depth resolution of the new method might be in the order of a few nm, the detection limit about 0.01% or 5 × 1018 atoms cm–3 of Co.\",\"PeriodicalId\":7814,\"journal\":{\"name\":\"Analytical Communications\",\"volume\":\"178 1\",\"pages\":\"27-29\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1999-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"13\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Analytical Communications\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1039/A809804B\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Analytical Communications","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1039/A809804B","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Depth profiling of a Co-implanted silicon wafer by total-reflection X-ray fluorescence analysis after repeated oxidation and HF-etching
A new method of depth profiling has been developed and applied to a Co-implanted Si-wafer. A square section of only some cm2 was chosen, a thin near-surface sublayer oxidized by an oxygen plasma and the oxidized sublayer precisely etched by a solution of hydrofluoric acid. The mass of Si within the sublayer was determined via differential weighing of the wafer piece and the mass of Co determined by TXRF (total reflection X-ray fluorescence) of the loaded acidic solution. These steps were repeated time and again in order to record a total depth profile showing the relative concentration of Co dependent on the depth within the wafer. The integration of this profile gave a total dose of 1.13 × 1017 ions cm–2 with high accuracy. The depth resolution of the new method might be in the order of a few nm, the detection limit about 0.01% or 5 × 1018 atoms cm–3 of Co.