外延半导体量子纳米结构的制备与表征

M. Berti, A. Drigo, M. Mazzer, A. Camporese, G. Torzo, G. Rossetto
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引用次数: 1

摘要

为了了解生长参数对纳米结构尺寸分布的影响,我们在GaAs衬底上对MOVPE生长的InP岛进行了RBS和AFM表征。在580°C +650°C的温度范围内,沉积的InP总量与温度无关,相反,温度影响生长岛屿的形态。这项工作是利用MOVPE沉积中衬底和薄膜之间的不匹配引起的应变来获得纳米级半导体岛(量子点)的自组织生长可行性研究的一部分。特别是,我们关于岛屿大小的数据与关于岛屿-基质系统总能量最小化的分析和数值模型的初步指示非常吻合。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Production and Characterization of Quantum Nanostructures of Epitaxial Semiconductors
An experimental study has been performed using RBS and AFM characterization on InP islands grown by MOVPE on GaAs substrate, aiming to understand the influence of the growth parameters on the size distribution of the nanostructures. In the temperature range 580+650°C the total amount of deposited InP is independent of temperature which, on the contrary, affects the morphology of the growing islands.This work is part of a broader investigation on the feasibility of self organized growth to obtain nanosized semiconductor islands (Quantum Dots) by exploiting the mismatch-induced strain between substrate and epilayer in MOVPE deposition. In particular our data on the islands size are in very good agreement with preliminary indications of analytical and numerical models on the minimization of the total energy of the island-substrate system.
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