纳米压印技术在旋转式微编码器光栅刻度上的应用

T. Takeshita, Takuma Iwasaki, E. Higurashi, Tatsuya Miyazaki, R. Sawada
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引用次数: 0

摘要

利用纳米压印技术,研制了一种用于微旋转编码的旋转衍射光栅标度。由于可以同时对通孔和光栅图形进行加工,使得轴向的槽孔中心与刻度外围的高精度微图形中心的偏心误差小于3 μm。针对传统光刻工艺加工光栅尺度通孔定心精度差的问题,采用纳米压印技术具有划时代的意义。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Application of nano-imprint technology to grating scale for a rotary microencoder
Using nano-imprint technology we have developed a rotary diffraction grating scale, which is used for micro rotary encoding. The off-center error between the center of the trough-hole for a rotational axis and the center of the high-precision micro-pattern on the periphery of the scale is less than 3 μm because we are able to shape the through-hole and the grating pattern simultaneously. The use of nano-imprinting is epoch-making, in view of the traditionally poor centering precision of grating scale through-holes fabricated using the conventional photolithography coupled with machining of the through-hole.
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