{"title":"微工程用场致发射枪","authors":"A. Delong, V. Kolarik","doi":"10.1088/0022-3735/22/8/014","DOIUrl":null,"url":null,"abstract":"An electron gun has been designed for a TFE W 100 ZrO cathode with a magnetic lens for voltages up to 15 kV. The main fields of application are assumed to be electron beam lithography, electron beam diagnosis and analysis of microstructures.","PeriodicalId":16791,"journal":{"name":"Journal of Physics E: Scientific Instruments","volume":"132 1","pages":"612-614"},"PeriodicalIF":0.0000,"publicationDate":"1989-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"Field emission gun for microengineering application\",\"authors\":\"A. Delong, V. Kolarik\",\"doi\":\"10.1088/0022-3735/22/8/014\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An electron gun has been designed for a TFE W 100 ZrO cathode with a magnetic lens for voltages up to 15 kV. The main fields of application are assumed to be electron beam lithography, electron beam diagnosis and analysis of microstructures.\",\"PeriodicalId\":16791,\"journal\":{\"name\":\"Journal of Physics E: Scientific Instruments\",\"volume\":\"132 1\",\"pages\":\"612-614\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1989-08-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Physics E: Scientific Instruments\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1088/0022-3735/22/8/014\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Physics E: Scientific Instruments","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1088/0022-3735/22/8/014","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Field emission gun for microengineering application
An electron gun has been designed for a TFE W 100 ZrO cathode with a magnetic lens for voltages up to 15 kV. The main fields of application are assumed to be electron beam lithography, electron beam diagnosis and analysis of microstructures.