一种基于双分辨率曝光技术的2.2/3英寸4K2K CMOS图像传感器

2010 IEEE International Solid-State Circuits Conference - (ISSCC) Pub Date : 2010-03-18 DOI:10.1109/ISSCC.2010.5433977

Takeo Azuma, T. Imagawa, Sanzo Ugawa, Yusuke Okada, H. Komobuchi, M. Ishii, S. Kasuga, Y. Kato

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引用次数: 5

摘要

超高密度相机的最新趋势是从高清到4K2K，并将进一步扩展到8K4K /便携式4K2K。随着器件制造工艺技术的进步，对图像传感器的小型化、高分辨率、高灵敏度提出了迫切要求[1]。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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A 2.2/3-inch 4K2K CMOS image sensor based on dual resolution and exposure technique

The recent trend in ultra-high-density cameras is running from HD to 4K2K, which will further extend to 8K4K / portable 4K2K. With advancements in device fabrication process technologies, there has been a pressing need for the miniaturization as well as high resolution and high sensitivity in image sensors [1].

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2010 IEEE International Solid-State Circuits Conference - (ISSCC)

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