厚氮化层对GaN-on-3C-SiC/低电阻率Si传输损耗的影响

A. Bose, Debaleen Biswas, S. Hishiki, Sumito Ouchi, K. Kitahara, K. Kawamura, A. Wakejima
{"title":"厚氮化层对GaN-on-3C-SiC/低电阻率Si传输损耗的影响","authors":"A. Bose, Debaleen Biswas, S. Hishiki, Sumito Ouchi, K. Kitahara, K. Kawamura, A. Wakejima","doi":"10.1587/elex.19.20210563","DOIUrl":null,"url":null,"abstract":"Wereporttheeffectofathicknitridelayerontransmissionlossin GaN-on-3C-SiC/low resistivity Si (LR-Si). Microstrip lines of finite length and width with ground pads were fabricated on three GaN-on-3C-SiC/LR-Si epitaxial structures with varying nitride layer thicknesses of 3.2, 5.3, and 8.0 𝜇 m. The loss performance of microstrip lines on different substrates was evaluated in the frequency range of 0.1 to 9 GHz. The sample with 8.0 𝜇 m thick nitride layer showed a minimal loss of 0.3 dB/mm at 9 GHz compared to the other samples. The evaluated data from electromagnetic (EM) simulation also confirmed a decreasing trend of loss with increasing nitride layer thickness. Temperature dependent loss evaluation also verified the above fact.","PeriodicalId":13437,"journal":{"name":"IEICE Electron. Express","volume":"63 1","pages":"20210563"},"PeriodicalIF":0.0000,"publicationDate":"2022-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Influence of a thick nitride layer on transmission loss in GaN-on-3C-SiC/low resistivity Si\",\"authors\":\"A. Bose, Debaleen Biswas, S. Hishiki, Sumito Ouchi, K. Kitahara, K. Kawamura, A. Wakejima\",\"doi\":\"10.1587/elex.19.20210563\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Wereporttheeffectofathicknitridelayerontransmissionlossin GaN-on-3C-SiC/low resistivity Si (LR-Si). Microstrip lines of finite length and width with ground pads were fabricated on three GaN-on-3C-SiC/LR-Si epitaxial structures with varying nitride layer thicknesses of 3.2, 5.3, and 8.0 𝜇 m. The loss performance of microstrip lines on different substrates was evaluated in the frequency range of 0.1 to 9 GHz. The sample with 8.0 𝜇 m thick nitride layer showed a minimal loss of 0.3 dB/mm at 9 GHz compared to the other samples. The evaluated data from electromagnetic (EM) simulation also confirmed a decreasing trend of loss with increasing nitride layer thickness. Temperature dependent loss evaluation also verified the above fact.\",\"PeriodicalId\":13437,\"journal\":{\"name\":\"IEICE Electron. Express\",\"volume\":\"63 1\",\"pages\":\"20210563\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEICE Electron. Express\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1587/elex.19.20210563\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEICE Electron. Express","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1587/elex.19.20210563","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

研究了氮化氮层厚度对GaN-on-3C-SiC/低电阻率Si (LR-Si)传输损耗的影响。在氮化层厚度分别为3.2、5.3和8.0 μ m的3种GaN-on-3C-SiC/LR-Si外延结构上制备了带接地垫的有限长、有限宽微带线,并在0.1 ~ 9 GHz频率范围内对微带线在不同衬底上的损耗性能进行了评价。氮化层厚度为8.0 μ m的样品在9 GHz时的损耗最小,为0.3 dB/mm。电磁模拟的评估数据也证实了损耗随氮化层厚度的增加而减小。温度相关损耗评估也验证了上述事实。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Influence of a thick nitride layer on transmission loss in GaN-on-3C-SiC/low resistivity Si
Wereporttheeffectofathicknitridelayerontransmissionlossin GaN-on-3C-SiC/low resistivity Si (LR-Si). Microstrip lines of finite length and width with ground pads were fabricated on three GaN-on-3C-SiC/LR-Si epitaxial structures with varying nitride layer thicknesses of 3.2, 5.3, and 8.0 𝜇 m. The loss performance of microstrip lines on different substrates was evaluated in the frequency range of 0.1 to 9 GHz. The sample with 8.0 𝜇 m thick nitride layer showed a minimal loss of 0.3 dB/mm at 9 GHz compared to the other samples. The evaluated data from electromagnetic (EM) simulation also confirmed a decreasing trend of loss with increasing nitride layer thickness. Temperature dependent loss evaluation also verified the above fact.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信