半导体产率损失原因识别:一种数据挖掘方法

H. Barkia, X. Boucher, R. Riche, P. Beaune, Marie-Agnès Girard, David Rozier
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引用次数: 6

摘要

众所周知,半导体制造过程漫长而复杂。从硅片开始,在大约三个月的时间里进行多次处理。掌握制造工艺以及快速识别良率损失的原因是半导体制造工厂成功的关键。生产周期由生产和质量检验两个步骤组成。在生产和质量控制阶段收集的数据导致了庞大的异构数据库。为了了解产量损失的原因,我们提出了一种KDD (Knowledge Discovery from Databases)方法,该方法首先通过识别不同数据库中的聚类,然后通过识别它们之间的关系模式来探索隐藏在这些多个数据库中的知识。这些关系模式代表了潜在的产量损失原因。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Semiconductor yield loss' causes identification: A data mining approach
Semiconductor manufacturing processes are known to be long and complex. Starting from a silicon wafer, multiple treatments are applied for about three months. Mastering the manufacturing process as well as a rapid identification of yield loss' causes are the keys to a successful semiconductor fabrication plant. The production cycle is composed of a combination of production and quality inspection steps. Data collected at production and quality control steps, lead to huge heterogeneous databases. In order to understand yield loss causes, we propose a KDD (Knowledge Discovery from Databases) approach, which explores the knowledge hidden in these multiple databases, by identifying, first, clusters in the different databases and, second, relational patterns between them. These relational patterns represent potential yield loss' causes.
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