B. C. Richads, S. Cook, D. L. Pinch, G. W. Andrews
{"title":"采用新型氟化和非氟化前驱体制备高质量YBa2Cu3O7−δ薄膜","authors":"B. C. Richads, S. Cook, D. L. Pinch, G. W. Andrews","doi":"10.1051/jphyscol:1995547","DOIUrl":null,"url":null,"abstract":"The first high quality, YBa 2 Cu 3 O 7-5 thin films have been produced by MOCVD using the novel fluorinated and non-fluorinated precursors, [Ba(TDFND) 2 .tetraglyme], [Cu(TDFND) 2 ] and [Y(TMHD) 3 .4- t BuPyNO] 2 and the traditional β-diketonate complexes [Y(TMHD) 3 ] 3 and [Cu(TMHD) 2 ]. The novel precursors are thermally stable and highly volatile. Their low melting points, 90 K and critical current density, J c > 10 6 Acm -2 at 77K. Fluorine content ∼100 ppm has been determined by SIMS.","PeriodicalId":17944,"journal":{"name":"Le Journal De Physique Colloques","volume":"10 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"1995-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"MOCVD of high quality YBa2Cu3O7−δ thin films using novel fluorinated and non-fluorinated precursors\",\"authors\":\"B. C. Richads, S. Cook, D. L. Pinch, G. W. Andrews\",\"doi\":\"10.1051/jphyscol:1995547\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The first high quality, YBa 2 Cu 3 O 7-5 thin films have been produced by MOCVD using the novel fluorinated and non-fluorinated precursors, [Ba(TDFND) 2 .tetraglyme], [Cu(TDFND) 2 ] and [Y(TMHD) 3 .4- t BuPyNO] 2 and the traditional β-diketonate complexes [Y(TMHD) 3 ] 3 and [Cu(TMHD) 2 ]. The novel precursors are thermally stable and highly volatile. Their low melting points, 90 K and critical current density, J c > 10 6 Acm -2 at 77K. Fluorine content ∼100 ppm has been determined by SIMS.\",\"PeriodicalId\":17944,\"journal\":{\"name\":\"Le Journal De Physique Colloques\",\"volume\":\"10 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1995-06-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Le Journal De Physique Colloques\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1051/jphyscol:1995547\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Le Journal De Physique Colloques","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1051/jphyscol:1995547","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
MOCVD of high quality YBa2Cu3O7−δ thin films using novel fluorinated and non-fluorinated precursors
The first high quality, YBa 2 Cu 3 O 7-5 thin films have been produced by MOCVD using the novel fluorinated and non-fluorinated precursors, [Ba(TDFND) 2 .tetraglyme], [Cu(TDFND) 2 ] and [Y(TMHD) 3 .4- t BuPyNO] 2 and the traditional β-diketonate complexes [Y(TMHD) 3 ] 3 and [Cu(TMHD) 2 ]. The novel precursors are thermally stable and highly volatile. Their low melting points, 90 K and critical current density, J c > 10 6 Acm -2 at 77K. Fluorine content ∼100 ppm has been determined by SIMS.
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