{"title":"大口径多隙天线产生均匀ECR等离子体","authors":"上田 洋子, Y. Ueda, 寺西 秀明, Hideaki Teranishi, 田中 雅慶, Masayoshi Tanaka, 篠原 俊二郎, Shunjiro Shinohara, 河合 良信, Yoshinobu Kawai, ヨウコ ウエダ, ヒデアキ テラニシ, マサヨシ タナカ, シュンジロウ シノハラ, ヨシノブ カワイ","doi":"10.15017/17337","DOIUrl":null,"url":null,"abstract":"A uniform ECR plasma is produced with a multi slot antenna of 280mm in diameter. The radial profile of the ion saturation current density is examined as a function of microwave power and pressure. The radial uniformity of the ion saturation current density is within pm3% over 8 inches in diameter for the input microwave power lkW at pressure of 2mTorr. Furthermore, the deposition of a-Si：H films is attempted on glass substrates using mixture SiH4/He. When the microwave power is increased, the thickness of the films increases.","PeriodicalId":11722,"journal":{"name":"Engineering sciences reports, Kyushu University","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"1994-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"大口径マルチスロットアンテナによる均一 ECR プラズマの生成\",\"authors\":\"上田 洋子, Y. Ueda, 寺西 秀明, Hideaki Teranishi, 田中 雅慶, Masayoshi Tanaka, 篠原 俊二郎, Shunjiro Shinohara, 河合 良信, Yoshinobu Kawai, ヨウコ ウエダ, ヒデアキ テラニシ, マサヨシ タナカ, シュンジロウ シノハラ, ヨシノブ カワイ\",\"doi\":\"10.15017/17337\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A uniform ECR plasma is produced with a multi slot antenna of 280mm in diameter. The radial profile of the ion saturation current density is examined as a function of microwave power and pressure. The radial uniformity of the ion saturation current density is within pm3% over 8 inches in diameter for the input microwave power lkW at pressure of 2mTorr. Furthermore, the deposition of a-Si：H films is attempted on glass substrates using mixture SiH4/He. When the microwave power is increased, the thickness of the films increases.\",\"PeriodicalId\":11722,\"journal\":{\"name\":\"Engineering sciences reports, Kyushu University\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1994-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Engineering sciences reports, Kyushu University\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.15017/17337\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Engineering sciences reports, Kyushu University","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.15017/17337","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A uniform ECR plasma is produced with a multi slot antenna of 280mm in diameter. The radial profile of the ion saturation current density is examined as a function of microwave power and pressure. The radial uniformity of the ion saturation current density is within pm3% over 8 inches in diameter for the input microwave power lkW at pressure of 2mTorr. Furthermore, the deposition of a-Si：H films is attempted on glass substrates using mixture SiH4/He. When the microwave power is increased, the thickness of the films increases.
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