萘酚标记聚甲基丙烯酸的合成及光谱pH滴定

Y. Itoh, K. Ogura, T. Hirota, A. Hachimori, K. Abe
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引用次数: 3

摘要

以甲基丙烯酸或丙烯酰胺为原料,与3位异构体甲基丙烯氨基酚(methacryloylaminonaphthol)聚合,制备了具有小摩尔分数萘酚(NpOH)残留物的聚甲基丙烯酸(PMA)和聚丙烯酰胺(PAAm)。用光谱pH滴定法测定了npoh标记PAAm的表观pK值(pKobsd),观察了取代基对其表观pK值的影响。PMA的静电表面电位(ψ)是由标记的PMA和PAAm的pKobsd值的差来计算的。得到的ψ值随着氢氧根与聚合物主链间距的增大而减小。这清楚地表明ψ值是到多晶体表面距离的敏感函数。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Syntheses and spectroscopic pH titrations of naphthol-labeled poly(methacrylic acid)s

Poly(methacrylic acid) (PMA) and poly(acrylamide) (PAAm) with a small mole fraction of naphthol (NpOH) residues were prepared by polymerization of methacrylic acid or acrylamide with three position isomers, methacryloylaminonaphthol. The substituent effect on the apparent pK values (pKobsd), determined by spectroscopic pH titrations in aqueous solution, was observed for the NpOH-labeled PAAm. The electrostatic surface potential (ψ) for PMA was calculated from the difference in the pKobsd values for the labeled PMA and PAAm. The obtained ψ value decreased as the spacing between the OH moiety and the polymer main chain increased. This clearly indicates that the ψ value is a sensitive function of the distance from the polyion surface.

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