{"title":"脉冲镀中质量输运的实验研究","authors":"M. Datta, D. Landolt","doi":"10.1016/0376-4583(85)90022-6","DOIUrl":null,"url":null,"abstract":"<div><p>Mass transport during the electrodeposition of copper from acidified sulphate solution using single and multiple pulses was studied. Experimental results obtained in a diffusion cell and with a rotating hemispherical electrode are compared with published theoretical calculations of various degrees of mathematical sophistication and complexity. The simple duplex diffusion-layer model proposed by Ibl gives adequate values of the pulse limiting current density for many practical purposes. The agreement with experiment can be further improved by using a semi-empirical modification of the model.</p></div>","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"1985-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0376-4583(85)90022-6","citationCount":"56","resultStr":"{\"title\":\"Experimental investigation of mass transport in pulse plating\",\"authors\":\"M. Datta, D. Landolt\",\"doi\":\"10.1016/0376-4583(85)90022-6\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Mass transport during the electrodeposition of copper from acidified sulphate solution using single and multiple pulses was studied. Experimental results obtained in a diffusion cell and with a rotating hemispherical electrode are compared with published theoretical calculations of various degrees of mathematical sophistication and complexity. The simple duplex diffusion-layer model proposed by Ibl gives adequate values of the pulse limiting current density for many practical purposes. The agreement with experiment can be further improved by using a semi-empirical modification of the model.</p></div>\",\"PeriodicalId\":22037,\"journal\":{\"name\":\"Surface Technology\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1985-06-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1016/0376-4583(85)90022-6\",\"citationCount\":\"56\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Surface Technology\",\"FirstCategoryId\":\"1087\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/0376458385900226\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface Technology","FirstCategoryId":"1087","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/0376458385900226","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Experimental investigation of mass transport in pulse plating
Mass transport during the electrodeposition of copper from acidified sulphate solution using single and multiple pulses was studied. Experimental results obtained in a diffusion cell and with a rotating hemispherical electrode are compared with published theoretical calculations of various degrees of mathematical sophistication and complexity. The simple duplex diffusion-layer model proposed by Ibl gives adequate values of the pulse limiting current density for many practical purposes. The agreement with experiment can be further improved by using a semi-empirical modification of the model.