{"title":"锥形硅通孔电容的封闭表达式","authors":"Jinrong Su, Wenmei Zhang","doi":"10.1109/IMWS-AMP.2015.7325022","DOIUrl":null,"url":null,"abstract":"Closed-form expressions of the parasitic insulator capacitance and the substrate capacitance for tapered through silicon vias (TSVs) are proposed. The expressions are functions of the geometric and material parameters of TSVs. They also can be applied to the cylindrical TSVs when the slope angle is zero. The two parasitic capacitances increase as the slope angle increases, which implies that the tapered TSVs have larger capacitances compared with the cylindrical TSVs. Computer Simulation Technology Electromagnetic StudioTM (CST EMS) is used to verify the expressions. The results indicate the maximum errors between the expressions and simulation results for the insulator capacitance and the substrate capacitance are 6.27% and 4.15%, respectively.","PeriodicalId":6625,"journal":{"name":"2015 IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP)","volume":"12 1","pages":"1-4"},"PeriodicalIF":0.0000,"publicationDate":"2015-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Closed-form expressions for the capacitance of tapered through-silicon vias\",\"authors\":\"Jinrong Su, Wenmei Zhang\",\"doi\":\"10.1109/IMWS-AMP.2015.7325022\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Closed-form expressions of the parasitic insulator capacitance and the substrate capacitance for tapered through silicon vias (TSVs) are proposed. The expressions are functions of the geometric and material parameters of TSVs. They also can be applied to the cylindrical TSVs when the slope angle is zero. The two parasitic capacitances increase as the slope angle increases, which implies that the tapered TSVs have larger capacitances compared with the cylindrical TSVs. Computer Simulation Technology Electromagnetic StudioTM (CST EMS) is used to verify the expressions. The results indicate the maximum errors between the expressions and simulation results for the insulator capacitance and the substrate capacitance are 6.27% and 4.15%, respectively.\",\"PeriodicalId\":6625,\"journal\":{\"name\":\"2015 IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP)\",\"volume\":\"12 1\",\"pages\":\"1-4\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-07-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2015 IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IMWS-AMP.2015.7325022\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMWS-AMP.2015.7325022","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Closed-form expressions for the capacitance of tapered through-silicon vias
Closed-form expressions of the parasitic insulator capacitance and the substrate capacitance for tapered through silicon vias (TSVs) are proposed. The expressions are functions of the geometric and material parameters of TSVs. They also can be applied to the cylindrical TSVs when the slope angle is zero. The two parasitic capacitances increase as the slope angle increases, which implies that the tapered TSVs have larger capacitances compared with the cylindrical TSVs. Computer Simulation Technology Electromagnetic StudioTM (CST EMS) is used to verify the expressions. The results indicate the maximum errors between the expressions and simulation results for the insulator capacitance and the substrate capacitance are 6.27% and 4.15%, respectively.