锥形硅通孔电容的封闭表达式

Jinrong Su, Wenmei Zhang
{"title":"锥形硅通孔电容的封闭表达式","authors":"Jinrong Su, Wenmei Zhang","doi":"10.1109/IMWS-AMP.2015.7325022","DOIUrl":null,"url":null,"abstract":"Closed-form expressions of the parasitic insulator capacitance and the substrate capacitance for tapered through silicon vias (TSVs) are proposed. The expressions are functions of the geometric and material parameters of TSVs. They also can be applied to the cylindrical TSVs when the slope angle is zero. The two parasitic capacitances increase as the slope angle increases, which implies that the tapered TSVs have larger capacitances compared with the cylindrical TSVs. Computer Simulation Technology Electromagnetic StudioTM (CST EMS) is used to verify the expressions. The results indicate the maximum errors between the expressions and simulation results for the insulator capacitance and the substrate capacitance are 6.27% and 4.15%, respectively.","PeriodicalId":6625,"journal":{"name":"2015 IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP)","volume":"12 1","pages":"1-4"},"PeriodicalIF":0.0000,"publicationDate":"2015-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Closed-form expressions for the capacitance of tapered through-silicon vias\",\"authors\":\"Jinrong Su, Wenmei Zhang\",\"doi\":\"10.1109/IMWS-AMP.2015.7325022\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Closed-form expressions of the parasitic insulator capacitance and the substrate capacitance for tapered through silicon vias (TSVs) are proposed. The expressions are functions of the geometric and material parameters of TSVs. They also can be applied to the cylindrical TSVs when the slope angle is zero. The two parasitic capacitances increase as the slope angle increases, which implies that the tapered TSVs have larger capacitances compared with the cylindrical TSVs. Computer Simulation Technology Electromagnetic StudioTM (CST EMS) is used to verify the expressions. The results indicate the maximum errors between the expressions and simulation results for the insulator capacitance and the substrate capacitance are 6.27% and 4.15%, respectively.\",\"PeriodicalId\":6625,\"journal\":{\"name\":\"2015 IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP)\",\"volume\":\"12 1\",\"pages\":\"1-4\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-07-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2015 IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IMWS-AMP.2015.7325022\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMWS-AMP.2015.7325022","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

提出了锥形硅通孔(tsv)的寄生绝缘子电容和衬底电容的封闭表达式。表达式是tsv几何参数和材料参数的函数。当斜率角为零时,它们也可以应用于圆柱形tsv。两种寄生电容随坡角的增大而增大,表明锥形tsv比圆柱形tsv具有更大的电容。利用计算机仿真技术电磁学软件(CST EMS)对表达式进行验证。结果表明,对绝缘子电容和衬底电容的计算公式与仿真结果的最大误差分别为6.27%和4.15%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Closed-form expressions for the capacitance of tapered through-silicon vias
Closed-form expressions of the parasitic insulator capacitance and the substrate capacitance for tapered through silicon vias (TSVs) are proposed. The expressions are functions of the geometric and material parameters of TSVs. They also can be applied to the cylindrical TSVs when the slope angle is zero. The two parasitic capacitances increase as the slope angle increases, which implies that the tapered TSVs have larger capacitances compared with the cylindrical TSVs. Computer Simulation Technology Electromagnetic StudioTM (CST EMS) is used to verify the expressions. The results indicate the maximum errors between the expressions and simulation results for the insulator capacitance and the substrate capacitance are 6.27% and 4.15%, respectively.
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