添加剂对电沉积镍早期生长的影响

P. Sibley , P.A. Brook
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引用次数: 2

摘要

采用扫描电镜和透射电镜研究了不同添加剂对铜基底电沉积镍外延生长的影响。外延区、过渡区和条件控制生长区与添加剂的种类和浓度以及衬底取向有关。外延区和过渡区都在1μm到1μm的范围内延伸。5μm。过渡阶段的开始通常与生长断层有关。结果与添加剂在不同取向上的吸附一致,然后由于添加剂部分或全部掺入其还原产物而引起晶格扰动。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The effect of addition agents on the early stages of growth of electrodeposited nickel

The effects of a number of addition agents on the epitaxial growth of electrodeposited nickel on copper substrates were examined using scanning and transmission electron microscopy. Those regions of epitaxy, transition and condition controlled growth were observed to be dependent on type and concentration of additive and on the substrate orientation. Both the epitaxial and transition regions extended over the range of <1μm to > 5 μm. The onset of the transition stage was generally associated with growth faults. The results are consistent with adsorption of the additives in different orientations followed by lattice disturbances due to the incorporation of part or whole of the additive on its reduction product.

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