x射线平面形貌:应变成像的一种强大的非破坏性工具

M. Verezhak, S. Van Petegem, A. Rodriguez-Fernandez, P. Godard, Klaus Wakonig, D. Karpov, V. Jacques, A. Menzel, L. Thilly, A. Diaz
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引用次数: 2

摘要

晶体材料中的应变和缺陷对所需材料的独特机械、电和磁性能负责,使其研究成为材料表征、制造和设计的重要任务。现有的应变场可视化技术,如透射电子显微镜和衍射,都是破坏性的,并且仅限于材料的薄片。另一方面,非破坏性x射线成像方法要么分辨率降低,要么不够强大,无法广泛应用。在这里,我们提出了一种新的应变成像方法——x射线平面形貌,并展示了它在微压缩后的InSb微柱上的应用,其中应变区域以30 nm的空间分辨率可视化。因此,x射线平面形貌学证明了它是一种强大的非破坏性方法,可以在几十纳米的空间分辨率下成像大块晶体样品中的应变场。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
X-ray ptychographic topography: A robust nondestructive tool for strain imaging
Strain and defects in crystalline materials are responsible for the distinct mechanical, electric and magnetic properties of a desired material, making their study an essential task in material characterization, fabrication and design. Existing techniques for the visualization of strain fields, such as transmission electron microscopy and diffraction, are destructive and limited to thin slices of the materials. On the other hand, non-destructive X-ray imaging methods either have a reduced resolution or are not robust enough for a broad range of applications. Here we present X-ray ptychographic topography, a new method for strain imaging, and demonstrate its use on an InSb micro-pillar after micro-compression, where the strained region is visualized with a spatial resolution of 30 nm. Thereby, X-ray ptychographic topography proves itself as a robust non-destructive approach for the imaging of strain fields within bulk crystalline specimens with a spatial resolution of a few tens of nanometers.
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