{"title":"纳米金刚石的合成、表征及其在SiO2基体上抗抛光的应用","authors":"M. Banisaid, Kharat An","doi":"10.21767/0972-768X.1000262","DOIUrl":null,"url":null,"abstract":"In current study nanodiamond particles were synthesized, purified and characterized. Then the nanodiamond surface was firstly oxidized to establish a homogeneous layer of COOH groups. Finally, the functionalized particles were deposited on the SiO2 substrate and its anti-polishing behavior was investigated. The resulting products in this research were characterized by FT-TR, TGA, TEM and SEM.","PeriodicalId":13865,"journal":{"name":"international journal of chemical sciences","volume":"28 1","pages":"1-10"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Synthesis and Characterizations of Nanodiamond and its Application as Anti-Polishing Agent on SiO2 Substrate\",\"authors\":\"M. Banisaid, Kharat An\",\"doi\":\"10.21767/0972-768X.1000262\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In current study nanodiamond particles were synthesized, purified and characterized. Then the nanodiamond surface was firstly oxidized to establish a homogeneous layer of COOH groups. Finally, the functionalized particles were deposited on the SiO2 substrate and its anti-polishing behavior was investigated. The resulting products in this research were characterized by FT-TR, TGA, TEM and SEM.\",\"PeriodicalId\":13865,\"journal\":{\"name\":\"international journal of chemical sciences\",\"volume\":\"28 1\",\"pages\":\"1-10\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"international journal of chemical sciences\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.21767/0972-768X.1000262\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"international journal of chemical sciences","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.21767/0972-768X.1000262","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Synthesis and Characterizations of Nanodiamond and its Application as Anti-Polishing Agent on SiO2 Substrate
In current study nanodiamond particles were synthesized, purified and characterized. Then the nanodiamond surface was firstly oxidized to establish a homogeneous layer of COOH groups. Finally, the functionalized particles were deposited on the SiO2 substrate and its anti-polishing behavior was investigated. The resulting products in this research were characterized by FT-TR, TGA, TEM and SEM.
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
