融合感兴趣的金属镀层的双脉冲LIBS分析:应用免校准技术的深度剖面和半定量元素组成

IF 0.5 Q4 NUCLEAR SCIENCE & TECHNOLOGY
S. Almaviva, F. Colao, I. Menicucci, M. Pistilli
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引用次数: 0

摘要

在这项工作中,我们报告了通过ns双脉冲LIBS技术对核聚变技术感兴趣的薄金属涂层的表征。该涂层由钨(W)或钨钽(W-Ta)混合物组成,用氘(D)富集,以模拟在真空容器(VV)的导流区被核燃料污染的下一代装置的等离子体表面材料(PFMs)或组件(PFCs),特别注意ITER,其导流器将由W制成。双脉冲LIBS技术允许在低浓度下检测D和Ta。单次激光发射,平均烧蚀速率约为110纳米。校准自由(CF-LIBS)程序提供了涂层中保留氘的半定量估计,而不需要参考样品。结果表明,LIBS是一种合格的诊断工具,具有高灵敏度和准确性,对样品的破坏最小,无需PFCs操作。CF-LIBS程序可用于搜索VV中任何其他物质,而无需任何初步参考样品。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Double Pulse LIBS Analysis of Metallic Coatings of Fusionistic Interest: Depth Profiling and Semi-Quantitative Elemental Composition by Applying the Calibration Free Technique
In this work we report the characterization of thin metallic coatings of interest for nuclear fusion technology through the ns double-pulse LIBS technique. The coatings, composed of a tungsten (W) or tungsten-tantalum (W-Ta) mixture were enriched with deuterium (D), to simulate plasma-facing materials (PFMs) or components (PFCs) of the next generation devices contaminated with nuclear fuel in the divertor area of the vacuum vessel (VV), with special attention to ITER, whose divertor will be made of W. The double pulse LIBS technique allowed for the detection of D and Ta at low concentrations, with a single laser shot and an average ablation rate of about 110 nm. The calibration free (CF-LIBS) procedure provided a semi-quantitative estimation of the retained deuterium in the coatings, without the need of reference samples. The presented results demonstrate that LIBS is an eligible diagnostic tool to characterize PFCs with high sensitivity and accuracy, being minimally destructive on the samples, without PFCs manipulation. The CF-LIBS procedure can be used for the search for any other materials in the VV without any preliminary reference samples.
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来源期刊
CiteScore
1.30
自引率
0.00%
发文量
56
期刊介绍: The Journal of Nuclear Engineering and Radiation Science is ASME’s latest title within the energy sector. The publication is for specialists in the nuclear/power engineering areas of industry, academia, and government.
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