chzochralski硅中缓慢的少数载流子捕获和释放:热供体和掺杂密度的影响

M. Siriwardhana, D. Macdonald, F. Heinz, F. Rougieux
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引用次数: 3

摘要

利用瞬态光导测量技术研究了Cz单晶硅片中与热供体有关的缺陷的俘获特性。样品被退火不同长度的时间,以产生一系列的热供体浓度。在关闭光照后,利用光导衰减测量了脱陷时间常数。为了得到解陷时间常数的估计,测量结果用指数项拟合。我们发现去捕获时间常数与热供体的浓度成反比,而在没有热供体的样品中没有观察到捕获。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Slow minority carrier trapping and de-trapping in Czochralski silicon: Influence of thermal donors and the doping density
The trapping characteristics of defects related to thermal donors have been studied with transient photoconductance measurements in Cz monocrystalline silicon wafers. The samples were annealed for various lengths of time to create a range of thermal donor concentrations. The de-trapping time constant was measured using photoconductance decay after the illumination is turned off. In order to obtain an estimate of the de-trapping time constants, the measurements were fitted with exponential terms. We find that the de-trapping time constant is inversely related to the concentration of thermal donors, while trapping is not observed in samples without thermal donors.
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