增加量子约束对p沟道无结晶体管栅电容和阈值电压的影响

Md. Khirul Alam Titu, S. Hasan, M. Adnan
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引用次数: 1

摘要

本文采用自一致求解法研究了p型矩形栅无结场效应晶体管(RG-JLFET)和双栅无结场效应晶体管(DG-JLFET)的电容电压(C-V)特性和阈值电压变化。自洽求解器求解具有适当边界条件的薛定谔-泊松方程,并考虑了波函数穿透和其他量子力学效应。我们比较了器件参数变化(如沟道厚度、氧化物厚度和掺杂浓度)对两种晶体管结构阈值电压控制的影响。对发现的结果也给出了物理解释。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Impact of Increased Quantum Confinement on Gate Capacitance and Threshold Voltage of p Channel Junctionless Transistor
In this work, by employing self-consistent solver we study Capacitance-Voltage (C-V) characteristics and the threshold voltage variation of p-type Rectangular Gate Junctionless Field Effect Transistor (RG-JLFET) and Double Gate Junctionless Field Effect Transistor (DG-JLFET). The selfconsistent solver solves Schrodinger-Poisson equations with appropriate boundary conditions and takes wave function penetration and other quantum mechanical effects into account. We compare the effect of device parameter variation (such as channel thickness, oxide thickness and doping concentration) on threshold voltage control for both transistor structures. Physical explanations of the found results are also provided.
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