聚合物基板上蒸发和等离子体增强化学气相沉积SiOx薄膜的生长模式

{"title":"聚合物基板上蒸发和等离子体增强化学气相沉积SiOx薄膜的生长模式","authors":"G. Dennler, A. Houdayer, P. Raynaud, I. Séguy, Y. Segui, M. Wertheimer","doi":"10.1023/A:1022865825205","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"25 1","pages":"43-59"},"PeriodicalIF":0.0000,"publicationDate":"2003-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"43","resultStr":"{\"title\":\"Growth Modes of SiOx Films Deposited by Evaporation and Plasma-Enhanced Chemical Vapor Deposition on Polymeric Substrates\",\"authors\":\"G. Dennler, A. Houdayer, P. Raynaud, I. Séguy, Y. Segui, M. Wertheimer\",\"doi\":\"10.1023/A:1022865825205\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":20249,\"journal\":{\"name\":\"Plasmas and Polymers\",\"volume\":\"25 1\",\"pages\":\"43-59\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2003-03-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"43\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Plasmas and Polymers\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1023/A:1022865825205\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Plasmas and Polymers","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1023/A:1022865825205","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}