超声喷雾热解p-CdTe薄膜的光学和电学性质

S. Gunjal, Y. Khollam, R. R. Udawant, S. Jadkar, P. Shelke, J. Sali, K. Mohite
{"title":"超声喷雾热解p-CdTe薄膜的光学和电学性质","authors":"S. Gunjal, Y. Khollam, R. R. Udawant, S. Jadkar, P. Shelke, J. Sali, K. Mohite","doi":"10.1109/ICANMEET.2013.6609308","DOIUrl":null,"url":null,"abstract":"The p-CdTe films are prepared on thoroughly cleaned glass substrates by using ultrasonic spray pyrolysis techniques in-situ reducing atmosphere with air-ambient at 548 and 573 K. The resultant films are characterized by using X-ray diffraction (XRD), Raman spectroscopy, scanning electron microscopy (SEM), energy dispersive X-ray (EDAX) analysis, UV-Visible spectroscopy and Hall measurement set-up. The characterization studies revealed crystallization of the main p-CdTe phase with minor oxidation corresponding to TeO2 in resultant films. The uniform size distribution of spherical particles with average particle size = 0.2 μm is noted from SEM studies. The optical properties are found to be absorbance (α) = 0.80 and band gap (Eg) = 1.46 eV for the films prepared at 573 K. The less oxidation at higher processing temperature realized in XRD and EDAX studies might be due to higher crystallization rate of p-CdTe dominating the oxidation. The Hall coefficient, RH = 0.0205 × 104 cm3/C, resistivity, r = 0.5812 × 102 Ω-cm and negative current value in Hot probe experiment indicated p-type semiconductor nature of resultant films processed at 573 K. The higher concentration (n), and less mobility (μ) of majority charge carriers for the films processed at 573 K might be due to less oxidation at higher temperature.","PeriodicalId":13708,"journal":{"name":"International Conference on Advanced Nanomaterials & Emerging Engineering Technologies","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2013-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Optical and electrical properties of ultrasonic spray pyrolysized p-CdTe films\",\"authors\":\"S. Gunjal, Y. Khollam, R. R. Udawant, S. Jadkar, P. Shelke, J. Sali, K. Mohite\",\"doi\":\"10.1109/ICANMEET.2013.6609308\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The p-CdTe films are prepared on thoroughly cleaned glass substrates by using ultrasonic spray pyrolysis techniques in-situ reducing atmosphere with air-ambient at 548 and 573 K. The resultant films are characterized by using X-ray diffraction (XRD), Raman spectroscopy, scanning electron microscopy (SEM), energy dispersive X-ray (EDAX) analysis, UV-Visible spectroscopy and Hall measurement set-up. The characterization studies revealed crystallization of the main p-CdTe phase with minor oxidation corresponding to TeO2 in resultant films. The uniform size distribution of spherical particles with average particle size = 0.2 μm is noted from SEM studies. The optical properties are found to be absorbance (α) = 0.80 and band gap (Eg) = 1.46 eV for the films prepared at 573 K. The less oxidation at higher processing temperature realized in XRD and EDAX studies might be due to higher crystallization rate of p-CdTe dominating the oxidation. The Hall coefficient, RH = 0.0205 × 104 cm3/C, resistivity, r = 0.5812 × 102 Ω-cm and negative current value in Hot probe experiment indicated p-type semiconductor nature of resultant films processed at 573 K. The higher concentration (n), and less mobility (μ) of majority charge carriers for the films processed at 573 K might be due to less oxidation at higher temperature.\",\"PeriodicalId\":13708,\"journal\":{\"name\":\"International Conference on Advanced Nanomaterials & Emerging Engineering Technologies\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2013-07-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Conference on Advanced Nanomaterials & Emerging Engineering Technologies\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICANMEET.2013.6609308\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Advanced Nanomaterials & Emerging Engineering Technologies","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICANMEET.2013.6609308","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

采用超声波喷雾热解技术,在548和573 K的空气环境下原位还原气氛中制备了p-CdTe薄膜。利用x射线衍射(XRD)、拉曼光谱、扫描电子显微镜(SEM)、能量色散x射线(EDAX)分析、紫外可见光谱和霍尔测量装置对所得薄膜进行了表征。表征研究表明,p-CdTe主要相结晶,所得薄膜中TeO2发生轻微氧化。扫描电镜观察到球形颗粒粒径分布均匀,平均粒径为0.2 μm。在573 K下制备的薄膜光学性质为吸光度(α) = 0.80,带隙(Eg) = 1.46 eV。在XRD和EDAX研究中发现,在较高的加工温度下,p-CdTe的氧化程度较低,这可能是由于p-CdTe的结晶速率较高而导致的。热探针实验的霍尔系数RH = 0.0205 × 104 cm3/C,电阻率r = 0.5812 × 102 Ω-cm和负电流值表明,在573 K下加工得到的薄膜具有p型半导体性质。在573 K下处理的薄膜中,大多数载流子的浓度(n)较高,迁移率(μ)较低,这可能是由于在较高温度下氧化较少所致。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Optical and electrical properties of ultrasonic spray pyrolysized p-CdTe films
The p-CdTe films are prepared on thoroughly cleaned glass substrates by using ultrasonic spray pyrolysis techniques in-situ reducing atmosphere with air-ambient at 548 and 573 K. The resultant films are characterized by using X-ray diffraction (XRD), Raman spectroscopy, scanning electron microscopy (SEM), energy dispersive X-ray (EDAX) analysis, UV-Visible spectroscopy and Hall measurement set-up. The characterization studies revealed crystallization of the main p-CdTe phase with minor oxidation corresponding to TeO2 in resultant films. The uniform size distribution of spherical particles with average particle size = 0.2 μm is noted from SEM studies. The optical properties are found to be absorbance (α) = 0.80 and band gap (Eg) = 1.46 eV for the films prepared at 573 K. The less oxidation at higher processing temperature realized in XRD and EDAX studies might be due to higher crystallization rate of p-CdTe dominating the oxidation. The Hall coefficient, RH = 0.0205 × 104 cm3/C, resistivity, r = 0.5812 × 102 Ω-cm and negative current value in Hot probe experiment indicated p-type semiconductor nature of resultant films processed at 573 K. The higher concentration (n), and less mobility (μ) of majority charge carriers for the films processed at 573 K might be due to less oxidation at higher temperature.
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