{"title":"走向负电容电子学","authors":"M. Hoffmann","doi":"10.1142/s2737599422400023","DOIUrl":null,"url":null,"abstract":"Progress in electronics is limited by power dissipation constraints. Ferroelectric materials with a negative capacitance could help to overcome these limits. Especially, HfO2 and ZrO2 based ferroelectrics are promising for negative capacitance electronics due to their compatibility with modern transistor manufacturing processes. Recently, first negative capacitance transistors have been demonstrated. However, further investigations on the microscopic origin of negative capacitance in HfO2- and ZrO2-based ferroelectrics are needed. Lastly, opportunities for negative capacitance beyond transistors are discussed.","PeriodicalId":29682,"journal":{"name":"Innovation and Emerging Technologies","volume":null,"pages":null},"PeriodicalIF":2.4000,"publicationDate":"2022-06-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Toward negative capacitance electronics\",\"authors\":\"M. Hoffmann\",\"doi\":\"10.1142/s2737599422400023\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Progress in electronics is limited by power dissipation constraints. Ferroelectric materials with a negative capacitance could help to overcome these limits. Especially, HfO2 and ZrO2 based ferroelectrics are promising for negative capacitance electronics due to their compatibility with modern transistor manufacturing processes. Recently, first negative capacitance transistors have been demonstrated. However, further investigations on the microscopic origin of negative capacitance in HfO2- and ZrO2-based ferroelectrics are needed. Lastly, opportunities for negative capacitance beyond transistors are discussed.\",\"PeriodicalId\":29682,\"journal\":{\"name\":\"Innovation and Emerging Technologies\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":2.4000,\"publicationDate\":\"2022-06-29\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Innovation and Emerging Technologies\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1142/s2737599422400023\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Innovation and Emerging Technologies","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1142/s2737599422400023","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, MULTIDISCIPLINARY","Score":null,"Total":0}
Progress in electronics is limited by power dissipation constraints. Ferroelectric materials with a negative capacitance could help to overcome these limits. Especially, HfO2 and ZrO2 based ferroelectrics are promising for negative capacitance electronics due to their compatibility with modern transistor manufacturing processes. Recently, first negative capacitance transistors have been demonstrated. However, further investigations on the microscopic origin of negative capacitance in HfO2- and ZrO2-based ferroelectrics are needed. Lastly, opportunities for negative capacitance beyond transistors are discussed.