单电子晶体管的噪声特性

A.N. Tavkhelidze, J. Mygind
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引用次数: 0

摘要

我们测量了电流偏置铝单电子隧道(SET)晶体管的低频(5 mHz<f<30 Hz)噪声。精细的高频(HF)屏蔽使我们能够在T<100 mK下维持和研究给定的背景电荷配置数小时。在低于10 Hz的频率下,噪声主要是由电荷陷阱引起的,叠加在V(Vg)曲线上的噪声模式强烈依赖于由冷却顺序和应用射频辐射(包括来自4.2 K环境的热辐射)产生的特定背景电荷配置。噪声谱表现为1/f和1/f1/2依赖关系,并在f<100 mHz处饱和,可以用具有德拜-洛伦兹谱和松弛时间为秒级的双电平波动器(TLF)拟合。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Noise Properties of Single Electron Transistors

We have measured the low frequency (5 mHz<f<30 Hz) noise in current biased aluminium single electron tunneling (SET) transistors. A refined high frequency (HF) shielding allows us to maintain and study a given background charge configuration for many hours at T<100 mK. At frequencies below 10 Hz the noise is mainly due to charge traps, and the noise pattern superimposed on the V(Vg)-curve strongly depends on the particular background charge configuration resulting from the cooling sequence and the applied RF irradiation, including thermal radiation from the 4.2 K environment. The noise spectra, which show both 1/f and 1/f1/2 dependencies and saturate at f<100 mHz can be fitted by two-level fluctuators (TLF) with Debye–Lorentz spectra and relaxation times on the order of seconds.

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