重掺杂半导体中少数杂质态的起源

D. S. Domanevskii, V. V. Krasovskii, M. V. Prokopenya, V. A. Vilkotskii, S. V. Zhokhovets
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引用次数: 0

摘要

研究了重掺杂n型半导体的生长条件对非平衡空穴所在的高斯形状杂质带宽度和能量位置的影响。杂质带的能级被证明是由带相反电荷的晶体缺陷(所谓的结合)的结合引起的,包括几个浅层的供体杂质原子和一个深层的结构缺陷。这些状态的高斯展宽的原因是在一个给定的关联中相互之间的关联缺陷的随机空间排列。[忽略俄语文本]。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The Origin of the Minority Impurity States in Heavily Doped Semiconductors
The influence is examined of growth conditions of heavily doped n-type semiconductors on the width and energy position of Gaussian-shape impurity band where non-equilibrium holes are localized. The energy levels of the impurity band are shown to be caused by associations of oppositely charged crystal imperfections (so-called associates) including several shallow donor impurity atoms and a deep structural defect. The reason of Gaussian broadening of these states is a random spatial arrangement of associated imperfections about each other within a given associate. [Russian Text Ignored].
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