三维硒化铋(Bi2Se3)和铋锑铋拓扑绝缘体的内聚能计算:DFT研究

E. Hemba, T. Ikyumbur, E. A. Trisma, F. Gbaorun, F. Aungwa
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引用次数: 0

摘要

计算了三维拓扑绝缘体铋锑(BiSb)和硒化铋(Bi2Se3)的内聚能。Fritz Haber研究所的Ab-initio分子模拟(FHI-aims)代码被用于这个计算。在计算过程中使用FHI-aims代码的输出文件,计算单个自由原子和块体在每次迭代次数下的总能量。结果表明,铋原子在第3次迭代时趋于稳定,硒和锑原子在第5次迭代时趋于稳定。结果还表明,锑铋在第3次迭代获得稳定,硒化铋在第9次迭代获得稳定。这表明,在本文所研究的自由原子中,铋原子更稳定,而体铋锑原子更稳定。利用优化后的参数计算了bib和Bi2Se3的内聚能。计算结果表明,BiSb和Bi2Se3的内聚能分别为1.02eV和1.76eV。该结果与实验结果比较良好,误差很小,锑铋为1.30%,硒化铋为29.55%。在这项工作中观察到的偏差可能是由于固体的DFT计算而不是原子本身。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Calculation of Cohesive Energies of 3-D Bismuth Selenide (Bi2Se3) and Bismuth Antimony BiSb Topological Insulators: DFT Study
The cohesive energies of 3-dimensional (3-D) topological insulators bismuth antimony (BiSb) and bismuth selenide (Bi2Se3) were calculated. The Fritz Haber Institute Ab-initio molecular simulations (FHI-aims) code was employed for this calculation.  The output files of the FHI-aims code were used during the computation and the total energies at each number of iterations for single free atoms and bulk were then calculated. The results from this work revealed that bismuth atom becomes stable at 3rd iteration meanwhile both selenium and antimony atoms gain stability at the 5th iteration. The results also showed that bismuth antimony acquire stability at the 3rd iteration and bismuth selenide gain stability at 9th iteration. This implies that among the free atoms studied in this work bismuth atom is more stable and for the bulk bismuth antimony is more stable. The cohesive energies of BiSb and Bi2Se3 were calculated using the optimized parameters. The results obtained from the calculation of the cohesive energies in this work were 1.02eV and 1.76eV for BiSb and Bi2Se3 respectively. This results compared reasonably well with experimental results and have little percentage errors of 1.30% for bismuth antimony and 29.55% for bismuth selenide. The deviation observed in this work may be due to the DFT calculation of the solid rather than the atoms themselves.
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