正离子回流对N-NBI系统的损害

M. Wada, T. Kenmotsu, K. Ikeda, M. Kisaki, H. Nakano, K. Tsumori
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引用次数: 3

摘要

利用Yamamura公式计算了真空系统残余气体中杂质离子氘、氧和碳以及杂质离子Mo和Cs的溅射产率。入射离子能量范围从10 keV到1 MeV,从提取电压到ITER的反向离子束能量可达ITER的全加速势。Cs对Mo的溅射产率达到10个原子/离子,是所研究的离子中最大的。在D离子萃取能下,以掠射角入射D+的情况下,研究了氘子在Mo中的保留对溅射收率的影响,证实了对溅射收率的影响很小;结果表明,在10 keV的D+中,Mo中D原子保留10%,溅射率仅提高2%。以1mev能量回流的D+离子会在距离Mo表面6µm深度处形成一层高浓度的氘原子。讨论了与粒子注入有关的可能失效模式。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Damage to N-NBI systems due to positive ion back-streaming
Sputtering yields of molybdenum (Mo) are computed for deuterium, oxygen and carbon as impurity ions from the residual gas of the vacuum system, as well as Mo and Cs using Yamamura formula. The incident ion energy ranges from 10 keV to 1 MeV, the back-streaming ion beam energy from the extraction voltage up to ITER full acceleration potential. The sputtering yield of Cs against Mo reached ten atoms per ion and was the largest among the investigated ion species. The effect due to retention of deuterons in Mo was studied for the case of grazing angle incidence of D+ at D- ion extraction energy to confirm the small effect onto the sputtering yield; the result obtained for 10 keV D+ for 10% retention of D atoms in Mo increased the sputtering yield only by 2%. The back-streaming D+ ions at 1 MeV energy should make a layer of high concentration deuterium atoms at 6 µm depth from the Mo surface. Possible failure mode associated with the particle implantation is discussed.
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