用原子探针层析成像法测定镍晶粒中的氧溶解度和氧化后的边界

J. Poplawsky, R. Pillai, Qing-Qiang Ren, A. Breen, B. Gault, M. Brady
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引用次数: 6

摘要

抗氧化能力差是极端环境下材料失效的关键因素。了解氧溶解度对新型高强度、高温抗氧化合金的计算辅助设计具有重要意义。氧在纯金属(如Ni)中的溶解度已经使用多种技术进行了研究,但原子探针断层扫描(APT)迄今尚未用于此类测量。APT是唯一一种同时提供高化学灵敏度(< 10ppm)和分辨率(< 1nm)的技术,允许在nms的氧化物/金属界面内进行成分测量。利用APT测量了高纯度和低纯度Ni样品在1000℃氧化48小时后,在氧化物/金属界面和晶界的不同深度处的氧含量。结果表明,在所有深度Ni金属中的氧溶解度<10s ppm,在GBs中的氧溶解度为1000s ppm。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Measuring Oxygen Solubility in Ni Grains and Boundaries after Oxidation Using Atom Probe Tomography
Poor oxidation resistance is a key contributor to material failure within extreme environments. Understanding oxygen solubility is important for computation aided design of new high strength, high-temperature oxidation resistant alloys. Oxygen solubility within pure metals, such as Ni, has been studied using a multitude of techniques, but Atom Probe Tomography (APT) has not been used for such a measurement to date. APT is the only technique offering both a high chemical sensitivity (<10 ppm) and resolution (<1 nm) allowing for a composition measurement within nms of the oxide/metal interface. APT was employed to measure the oxygen content at different depths from the oxide/metal interface as well as grain boundaries for a high and low purity Ni sample oxidized at 1000 °C for 48 hours. The results reveal <10s of ppm oxygen solubility within Ni metal at all depths and 100s of ppm of oxygen within GBs.
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