纳米压印技术的现状与展望

2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO) Pub Date : 2016-08-01 DOI:10.1109/NANO.2016.7751312

S. Matsui

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引用次数: 0

摘要

纳米压印是一种新兴的光刻技术，有望实现纳米结构的高通量图像化。基于机械压印原理，纳米压印技术可以突破传统技术中光衍射或光束散射的限制，实现图案分辨率的提高。纳米压印可应用于光学器件、磁性器件、大规模集成电路器件等。

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Current status and prospects of nanoimprint technology

Nanoimprint is an emerging lithographic technology that promises high-throughput patterning of nanostructures. Based on the mechanical embossing principle, nanoimprint technique can achieve pattern resolutions beyond the limitations set by the light diffractions or beam scatterings in other conventional techniques. Nanoimprint can be applied to optical device, magnetic device, LSI device and so on.

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2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO)

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