高激发分子的增强电子附着及其在脉冲等离子体中的应用

L. A. Pinnaduwage, W. Ding, D. McCorkle, C.Y. Ma
{"title":"高激发分子的增强电子附着及其在脉冲等离子体中的应用","authors":"L. A. Pinnaduwage, W. Ding, D. McCorkle, C.Y. Ma","doi":"10.1109/PPC.1999.823770","DOIUrl":null,"url":null,"abstract":"Studies conducted over the past several years have shown that dissociative electron attachment to highly-excited states of molecules have extremely large cross sections. Implications of this process for pulsed discharges used for H/sup -/ generation, material processing, and plasma remediation are discussed.","PeriodicalId":11209,"journal":{"name":"Digest of Technical Papers. 12th IEEE International Pulsed Power Conference. (Cat. No.99CH36358)","volume":"65 1","pages":"1322-1325 vol.2"},"PeriodicalIF":0.0000,"publicationDate":"1999-06-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Enhanced electron attachment to highly-excited molecules and its applications in pulsed plasmas\",\"authors\":\"L. A. Pinnaduwage, W. Ding, D. McCorkle, C.Y. Ma\",\"doi\":\"10.1109/PPC.1999.823770\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Studies conducted over the past several years have shown that dissociative electron attachment to highly-excited states of molecules have extremely large cross sections. Implications of this process for pulsed discharges used for H/sup -/ generation, material processing, and plasma remediation are discussed.\",\"PeriodicalId\":11209,\"journal\":{\"name\":\"Digest of Technical Papers. 12th IEEE International Pulsed Power Conference. (Cat. No.99CH36358)\",\"volume\":\"65 1\",\"pages\":\"1322-1325 vol.2\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1999-06-27\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Digest of Technical Papers. 12th IEEE International Pulsed Power Conference. (Cat. No.99CH36358)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/PPC.1999.823770\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Technical Papers. 12th IEEE International Pulsed Power Conference. (Cat. No.99CH36358)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PPC.1999.823770","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

过去几年进行的研究表明,分子高度激发态的解离电子附着具有极大的横截面。讨论了该工艺对H/sup /产生、材料处理和等离子体修复的脉冲放电的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Enhanced electron attachment to highly-excited molecules and its applications in pulsed plasmas
Studies conducted over the past several years have shown that dissociative electron attachment to highly-excited states of molecules have extremely large cross sections. Implications of this process for pulsed discharges used for H/sup -/ generation, material processing, and plasma remediation are discussed.
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