太赫兹频率下硅光学特性的温度和掺杂依赖性

Jun Zhou, Xin Rao, Shan Tu, Lu Duan, Xiao-dong Chen
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引用次数: 0

摘要

了解太赫兹(THz)频率下半导体的光学特性对太赫兹半导体的表征和应用至关重要。光学性质的预测需要精确地了解半导体在不同环境下的介电函数,如不同的温度和掺杂剂浓度。本文在85 ~ 520 K和0.1 ~ 3 THz的温度和频率范围内,利用太赫兹时域光谱(TDS)测量了硅在没有氦离子浓度和不同氦离子浓度下的光学性质。观察到太赫兹区自由载流子对复光学常数有很强的频率依赖性,并用德鲁德-洛伦兹模型对测量数据进行了分析。实验结果与分析结果吻合得很好。这项工作有助于理解物理,设计器件和应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Temperature and doping dependence of the optical properties of silicon at terahertz frequencies
Understanding the optical properties of semiconductors at terahertz (THz) frequencies is crucial to THz semiconductor characterization and applications. Prediction of the optical properties requires precise knowledge of the dielectric function of semiconductor in different environments, such as variable temperature and dopant concentration. In this work, the optical properties of silicon without and with different helium ion concentrations have been measured by using a THz time-domain spectroscopy (TDS) for the temperature and frequency ranges of 85-520 K and 0.1-3 THz, respectively. The strong frequency dependence of the complex optical constants due to the free carriers in the THz region has been observed and the measured data have been analyzed by using the Drude-Lorentz model. The experimental results and the analytical ones coincide with each other very well. This work is helpful for understanding the physics and designing devices and applications.
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