衬底偏压对CrN涂层组织和摩擦学性能的影响

IF 0.6 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY

Annales De Chimie-science Des Materiaux Pub Date : 2016-06-28 DOI:10.3166/ACSM.40.9-15

K. Aouadi, C. Nouveau, A. Besnard, B. Tlili, M. Chafra

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引用次数: 2

摘要

cr基磁控溅射层的显微组织、磨损和摩擦系数。在不同的衬底偏压下，通过磁控反应溅射在不锈钢和硅衬底上沉积CrN薄膜。研究了衬底偏置电压对薄膜结构和摩擦学性能的影响。结果表明:增大负偏压对涂层的微观组织有较大影响，晶粒尺寸增大，摩擦系数和磨损率等均受偏压的影响。

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Effect of substrate bias voltage on the microstructure and tribological properties of CrN coatings

Microstructure, wear and friction coefficient of cr-based magnetron sputtered layers. CrN films were deposited on stainless steel and silicon substrates via magnetron reactive sputtering under a systematic variation of the substrate bias voltage. The influence of the substrate bias voltage on the structural and tribological properties of the films was investigated. The results indicated that increasing the negative bias voltage have many influence on the characteristic of the coatings: concerning their microstructure, we observed that the grain size increased, while their coefficient of friction is influenced by the bias voltage like the wear rate.

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来源期刊

Annales De Chimie-science Des Materiaux 工程技术-材料科学：综合

CiteScore

1.70

自引率

25.00%

发文量

审稿时长

>12 weeks

期刊介绍： The ACSM is concerning the cutting-edge innovations in solid material science. The journal covers a broad spectrum of scientific fields, ranging all the way from metallurgy, semiconductors, solid mineral compounds, organic macromolecular compounds to composite materials. The editorial board encourages the submission of original papers that deal with all aspects of material science, including but not limited to synthesis and processing, property characterization, reactivity and reaction kinetics, evolution in service, and recycling. The papers should provide new insights into solid materials and make a significant original contribution to knowledge.