太阳能电池用掺镍硫化锌薄膜的制备与表征

A. Kucukarslan
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引用次数: 0

摘要

本研究采用超声喷雾热解技术在4005°C基片温度下,在显微镜玻璃基片上制备了纯的和不同掺镍量(4、8、12%)的ZnS薄膜,以及Ni掺杂对纯薄膜某些物理性能的影响。采用x射线衍射仪(XRD)、紫外可见分光光度计、双探针法和原子力显微镜(AFM)分别对膜的结构、光学、电学和表面性能进行了分析。XRD谱图包含宽峰,表明薄膜的结晶度较低。镍的掺杂使ZnS薄膜在可见光谱上具有较高的吸光度值。ZnS:Ni薄膜的光学带隙能值在3.71 ~ 3.96 eV之间。双探针测量结果表明,随着Ni掺杂的增加,ZnS薄膜的电导率显著提高。AFM结果表明,薄膜表面粗糙,分布均匀。镍的掺杂对薄膜的表面性能没有明显的影响。作为所有分析的结果;结果表明,Ni掺杂对ZnS薄膜的光学和电学性能有重要影响,但不改变薄膜的晶体结构和表面织构。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Preparation and Characterization of Nickel-Doped Zinc Sulphide Thin Films for Solar Cell Applications
This study presents the production of pure and different amounts of Ni-doped (4, 8, 12%) ZnS films on microscope glass substrate at 400  5°C substrate temperature with Ultrasonic Spray Pyrolysis Technique and the effect of Ni doping on some physical properties of pure films. X-ray diffractometer (XRD), UV-Vis spectrophotometer, two-probe method and atomic force microscope (AFM) were used to analyze the structural, optical, electrical and surface properties of all films, respectively. XRD patterns contains broad peaks showing a low crystallinity level for the films. Ni doping caused ZnS films to have high absorbance values through the visible spectrum. Optical band gap energy values of ZnS:Ni thin films were determined to be between 3.71-3.96 eV. Two-probe measurements revealed that the electrical conductivity values of ZnS films increased significantly depending on the Ni doping. AFM results showed that the films have an almost homogeneous distribution with a rough surface. No significant change was observed for the surface properties of the films due to the Ni doping. As a result of all analyzes; it was seen that Ni doping has an important effect on the optical and electrical properties of ZnS films, without modifying the crystalline structure or surface texture.
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