拓扑半金属中大载流子密度的量子极限霍尔效应

Guang Yang, Yi Zhang
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引用次数: 1

摘要

在$\nu = nh/eB\sim O(1)$处的量子极限霍尔效应需要强磁场$B$和低载流子密度$n$才能产生各种奇异的量子现象。我们提出即使在拓扑半金属中存在较大载流子密度残馀$n_e$和$n_h$相对于磁场$B$的情况下,也可以实现量子极限霍尔效应,其中单个费米表面等高线允许电子型和空穴型载流子,并接近电荷中性$n_e\sim n_h$。潜在的填充因子$\nu = |n_e-n_h|h/eB$明显违反了量子振荡的Onsager关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Quantum-limit Hall effect with large carrier density in topological semimetals
The quantum-limit Hall effect at $\nu = nh/eB\sim O(1)$ that hosts a variety of exotic quantum phenomena requires demanding strong magnetic field $B$ and low carrier density $n$. We propose to realize quantum-limit Hall effect even in the presence of large carrier density residues $n_e$ and $n_h$ relative to the magnetic field $B$ in topological semimetals, where a single Fermi surface contour allow both electron-type and hole-type carriers and approaches charge neutrality as $n_e\sim n_h$. The underlying filling factor $\nu = |n_e-n_h|h/eB$ explicitly violates the Onsager's relation for quantum oscillations.
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