{"title":"交变磁场下电沉积法制备ZnO薄膜","authors":"B. Altıokka, A. Yıldırım","doi":"10.7212/ZKUFBD.V8I1.1122","DOIUrl":null,"url":null,"abstract":"Thin films of polycrystalline ZnO were produced by electrodeposition under alternating magnetic field. The structures of the films deposited under a magnetic field were defined by X-ray diffractometer (XRD) and it revealed that the films formed in a hexagonal structure. The energy gaps of the films produced without magnetic field were estimated between 3.54 eV and 3.63 eV while the others varied from the 3.60 eV to the 3.79 eV.","PeriodicalId":17742,"journal":{"name":"Karaelmas Science and Engineering Journal","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2018-06-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"ZnO films obtained by electrodeposition under alternating magnetic field\",\"authors\":\"B. Altıokka, A. Yıldırım\",\"doi\":\"10.7212/ZKUFBD.V8I1.1122\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Thin films of polycrystalline ZnO were produced by electrodeposition under alternating magnetic field. The structures of the films deposited under a magnetic field were defined by X-ray diffractometer (XRD) and it revealed that the films formed in a hexagonal structure. The energy gaps of the films produced without magnetic field were estimated between 3.54 eV and 3.63 eV while the others varied from the 3.60 eV to the 3.79 eV.\",\"PeriodicalId\":17742,\"journal\":{\"name\":\"Karaelmas Science and Engineering Journal\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-06-26\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Karaelmas Science and Engineering Journal\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.7212/ZKUFBD.V8I1.1122\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Karaelmas Science and Engineering Journal","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.7212/ZKUFBD.V8I1.1122","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
ZnO films obtained by electrodeposition under alternating magnetic field
Thin films of polycrystalline ZnO were produced by electrodeposition under alternating magnetic field. The structures of the films deposited under a magnetic field were defined by X-ray diffractometer (XRD) and it revealed that the films formed in a hexagonal structure. The energy gaps of the films produced without magnetic field were estimated between 3.54 eV and 3.63 eV while the others varied from the 3.60 eV to the 3.79 eV.
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