基于银微片的氮化镓组装滑动键合技术的发展

M. Myśliwiec, R. Kisiel
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引用次数: 3

摘要

本文介绍了应用slip(固液互扩散键合)技术将GaN结构组装到具有Sn金属化的DBC(直接键合铜)衬底上的主要方面。研究了氮化镓欧姆接触金属化、氮化镓在DBC上的厚度以及键合参数(压力、温度、时间)对氮化镓结构与DBC衬底结合的影响。结果表明,微银烧结层与氮化镓或DBC金属化表面之间的界面是最薄弱的粘附点。在${8}\ MPa/280^{\ mathm {o}}C$下烧结的微银层的凝聚力超过${20}\ MPa$。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Development of SLID Bonding Technology for GaN Assembly Based on Ag Microflakes
This paper covers the main aspects of applying SLID (Solid Liquid InterDiffusion bonding) for assembly of GaN structures to DBC (Direct Bonded Copper) substrates with Sn metallization. The influence of GaN ohmic contact metallization, Sn thickness on DBC as well as bonding parameters (pressure, temperature, time) on adhesion of GaN structures to DBC substrate were investigated. It was found that the weakest points of adhesion are the interfaces between micro-Ag sintered layer and surfaces of GaN or DBC metallization. The cohesion of micro-Ag layer sintered at ${8}\ MPa/280^{\mathrm{o}}C$ exceeds ${20}\ MPa$.
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