级联GaN hemt在重复过电压和浪涌能量应力下的鲁棒性

Q. Song, Ruizhe Zhang, J. P. Kozak, Jingcun Liu, Qiang Li, Yuhao Zhang
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引用次数: 8

摘要

浪涌能量稳健性对于许多电力电子应用中的功率半导体器件至关重要,例如汽车动力系统和电网。硅和碳化硅mosfet可以通过雪崩方式耗散浪涌能量。然而,氮化镓高电子迁移率晶体管(HEMT)没有雪崩能力。最近的研究调查了p栅极GaN hemt的浪涌能量稳稳性,揭示了一个基于电容充电的耐受性过程。p栅GaN HEMT在重复浪涌能量应力下的降解也有报道。这项工作首次研究了650 v额定级联GaN HEMT在无箝位电感开关(UIS)测试中的重复浪涌能量稳稳性。级联GaN HEMT在重复应力作用下的破坏边界低于单一应力作用下的破坏边界。当浪涌能量接近重复失效边界时,设备不会立即失效,而是在有限的应力循环内失效。当峰值UIS电压降至失效边界的80%时,器件可以存活100万UIS循环,但在重复应力后显示出相当大的参数变化,包括在正向和反向传导期间导通电阻(RDS(ON))增加,失态漏极漏电流(IDSS)减少,以及漏源电容(CDS)的负移动。在重复UIS应力下器件失效和退化的这些行为可以用GaN hemt中的缓冲捕获积累来解释,这可能导致器件动态击穿电压的降低。这种物理解释也得到了基于物理的TCAD模拟的验证。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Robustness of Cascode GaN HEMTs under Repetitive Overvoltage and Surge Energy Stresses
Surge energy robustness is essential for power semiconductor devices in many power electronics applications, such as automotive powertrains and electrical grids. Si and SiC MOSFETs can dissipate surge energy via avalanche. However, GaN high-electron-mobility-transistor (HEMT) has no avalanche capability. Recent studies have investigated the surge energy robustness of p-gate GaN HEMTs, revealing a capacitive-charging-based withstanding process. The degradation of p-gate GaN HEMT under repetitive surge energy stresses has also been reported. This work, for the first time, studies the repetitive surge energy robustness of a 650-V rated cascode GaN HEMT in the unclamped inductive switching (UIS) test. The cascode GaN HEMT shows a lower failure boundary under the repetitive UIS stress than the one under the single UIS stress. When the surge energy approaches the repetitive failure boundary, devices do not fail immediately but within limited cycles of stress. Devices were found to survive 1 million UIS cycles when the peak UIS voltage is reduced to ~80% of the failure boundary, but show considerable parametric shifts after the repetitive stress, including an on-resistance (RDS(ON)) increase during both forward and reverse conductions, a reduction in the off-state drain leakage current (IDSS), and a negative shift of the drain-to-source capacitance (CDS). These behaviors of device failure and degradation under repetitive UIS stresses can be explained by the buffer trapping accumulation in GaN HEMTs, which may lead to a reduction of the device dynamic breakdown voltage. This physical explanation has also been validated by physics-based TCAD simulation.
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