量子成像、量子光刻和测不准原理

Y. Shih
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引用次数: 14

摘要

摘要:量子力学最令人惊讶的结果之一是两个或两个以上遥远粒子的纠缠。尽管我们对纠缠量子系统的基本问题仍有疑问,但量子纠缠已经开始在实际应用中发挥重要作用。量子成像是一个热点问题。量子成像有许多有趣的特点,对不同的应用都很有用。例如,量子成像可以是非局部的,这对安全的二维信息传输很有用。与经典成像相比,量子成像可以达到更高的空间分辨率,甚至可以超越衍射极限,这对光刻和其他微系统制造技术非常有用。然而,这并没有违反测不准原理,而是量子力学的多粒子现象。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Quantum imaging, quantum lithography and the uncertainty principle
Abstract:One of the most surprising consequences of quantum mechanics is the entanglement of two or more distant particles. Even though we still have questions in regard to fundamental issues of the entangled quantum systems, quantum entanglement has started to play important roles in practical applications. Quantum imaging is one of the hot topics. Quantum imaging has many interesting features which are useful for different applications. For example, quantum imaging can be nonlocal, which is useful for secure two-dimensional information transfer. Quantum imaging can reach a much higher spatial resolution comparing with classical imaging, even beyond the diffraction limit, which is useful for lithography and other microsystem fabrication technology. It is not a violation of the uncertainty principle, however, a quantum mechanical multi-particle phenomenon.
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