纳米结构n-WSe2薄膜的制备及其在半导体p-Si光电阴极中的应用

O. Rubinkovskaya, D. Fominski, V. Nevolin, R. Romanov, P. Kartsev, Hualin Jiang, V. Fominski
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引用次数: 0

摘要

研究了对脉冲激光沉积制备的薄膜前驱体进行热处理后,在p型硅上形成的WSe2薄膜结构和电导率改变的可能性。脉冲激光烧蚀WSe2和铼靶可以获得含有铼原子和β-W纳米颗粒包体的非晶膜WSex (x >2)。450℃的热处理使非晶态基体结晶,并在金属纳米颗粒周围形成层状的2H-WSe2壳层。铼掺杂制备了n型WSe2半导体薄膜,其性能(带隙~ 1.2 eV,催化活性高,电流输运阻力低)是一种很有前途的材料,可用于制造在酸溶液中高效光活化析氢的p-Si光电阴极。通过理论计算,确定了生成的WSe2膜在析氢反应中催化活性增强的局部区域。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Preparation of thin nanostructured n-WSe2 films and their application in semiconductor p-Si photocathodes for hydrogen production by water splitting
The possibilities of modification of the structure and type of conductivity of WSe2 films formed on p-type silicon by thermal treatment of a thin-film precursor, which was preliminarily created by pulsed laser deposition, are studied. Pulsed laser ablation of WSe2 and rhenium targets made it possible to obtain amorphous films WSex (x > 2) containing rhenium atoms and inclusions of β-W nanoparticles. Heat treatment at 450 °C caused the crystallization of the amorphous matrix and the formation of a layered 2H-WSe2 shell surrounded the metal nanoparticles. Doping with rhenium led to the production of n-type WSe2 semiconductor films, which, in terms of their properties (band gap ~ 1.2 eV, high catalytic activity, low resistance to current transport), represent a promising material for creating p-Si photocathodes for efficient light-activated hydrogen evolution in acid solution. Theoretical calculations are carried out, which make it possible to identify local areas on the surface of the formed WSe2 films with enhanced catalytic activity in hydrogen evolution reaction.
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