直流磁控溅射制备Ti-Nb-C薄膜及其表征

2021 IEEE 11th International Conference Nanomaterials: Applications & Properties (NAP) Pub Date : 2021-09-05 DOI:10.1109/NAP51885.2021.9568606

V. Ivashchenko, A. Onoprienko, P. Scrynskyy, Andriy Kozak, E. Olifan, A. Kovalchenko, A. Sinelnitchenko, Alexander Marchuk, V. Granko

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引用次数: 2

摘要

采用直流磁控共溅射技术，以单质Ti、Nb、复合Ti+Nb和石墨(C)为靶材，制备了Ti-Nb-C薄膜。比较研究了薄膜的微观结构、化学键和力学性能。x射线衍射(XRD)分析表明，Ti/C和Nb/C靶材共溅射沉积的薄膜中存在TiC和NbC晶体。复合靶材Ti+Nb和C共溅射得到的膜的XRD谱峰位于Ti-C和Nb-C膜对应峰之间的中间区域。x射线光电子能谱(XPS)表明，Ti-C和Nb-C键在沉积的Ti-Nb-C薄膜中占主导地位。结果表明，Ti-Nb-C薄膜是纳米复合材料，由立方TiC、NbC和TiC-NbC固溶体的结晶组成，外围包裹着无定形碳基基体。Ti-Nb-C膜的Knoop硬度最高，达到36.8 GPa。Ti-Nb-C薄膜分层前的平均摩擦系数最低(0.17)。

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Deposition and Characterization of Ti-Nb-C Films by DC Magnetron Sputtering

The films of the Ti-Nb-C system were deposited by direct current (DC) magnetron co-sputtering of elemental Ti, Nb, composite Ti+Nb, and graphite (C) targets. The microstructure, chemical bonds and mechanical properties of films were comparatively investigated. The X-ray diffraction (XRD) analysis revealed the presence of TiC and NbC crystallites in films deposited by co-sputtering of Ti/C and Nb/C targets. The peaks of the XRD spectra of the film obtained by co-spattering of the composite Ti+Nb and C targets are located in intermediate region between the corresponding peaks of the Ti-C and Nb-C films. The X-ray photoelectron spectroscopy (XPS) showed that the Ti-C and Nb-C bonds prevail in the deposited Ti-Nb-C films. It was suggested that the Ti-Nb-C films are nanocomposite and consist of the crystallites of the cubic TiC, NbC and TiC-NbC solid solutions surrounded by amorphous carbon-based matrix. The Knoop hardness of the Ti-Nb-C film is highest and reaches 36.8 GPa. The average friction coefficient determined before film delamination was lowest (0.17) in Ti-Nb-C film.

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2021 IEEE 11th International Conference Nanomaterials: Applications & Properties (NAP)

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