退火Si/Ti/Pt异质结构对氢传感器响应时间和信号的影响

W. Widanarto, F. Abdullatif, C. Senft, W. Hansch
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引用次数: 0

摘要

在掺磷硅电极上沉积钛(Ti)和铂(Pt)薄膜作为气敏电极,应用于开尔文和浮栅场效应晶体管(FG-FET)系统。薄膜在800℃的氧气中退火。采用SEM和EDX表征方法对这些薄膜的表面进行了研究。功函数随不同氢浓度的变化作为温度和湿度的函数进行了测量。结果表明:退火后形成了硅化钛(TiSi2)纳米颗粒和铂岛;退火TiSi2/Pt薄膜非常适合用于稳定基于FG-FET的氢传感器。该传感器可以在室温至135℃范围内检测浓度在0.3%至2%之间的H2。响应时间相当快,即t90 ~ 43.2秒。稳定性实验证明,传感器的信号模式在第一次调节后一个月保持稳定。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of Annealed Si/Ti/Pt Hetero Structure on The Response Time and Signals of Hydrogen Sensors
Titanium (Ti) and platinum (Pt) films deposited on p-doped Si electrode were incorporated as gas sensitive electrodes in Kelvin and Floating Gate Field Effect Transistor (FG-FET) systems. The films were annealed in oxygen at 800°C. SEM and EDX characterization methods were employed to study the surface of these films. Work function changes with respect to various hydrogen concentrations have been measured as a function of temperature and humidity. The results show that nano grains of titanium silicide (TiSi2) and Pt islands are formed after the annealing. Annealed TiSi2/Pt films are well suitable to significantly stabilize FG-FET based hydrogen sensor. The sensors can detect H2 in concentration range between 0.3% and 2% from room temperature up to 135°C. The response time is quite fast i.e. t90 ~ 43.2 seconds. An experiment on the stability has proved that signal pattern of the sensors remained stable one month after first conditioning.
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