基于漏电流机理的4H-SIC mosfet TDDB寿命统一模型

Hua Chen, Pan Zhao, Jiahao Liu, Yusen Su, Tuo Zheng, Hao Ni, Liang He
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引用次数: 1

摘要

在不同栅极电压和温度下测量了4H-SiC MOSFET的漏电流,揭示了区分FN隧穿电流、欧姆电流和FP发射的关键条件。假设临界条件为E模型和l/E模型的适用条件,提出了统一的时间相关介质击穿(TDDB)模型,该模型预测TDDB寿命比E模型长,比l/E模型短。关键词:tddb寿命模型;FN隧穿;电阻电流;FP排放;4 h-sic场效电晶体;E模型;l / Emodel
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A Unified 4H-SIC Mosfets TDDB Lifetime Model Based on Leakage Current Mechanism
The leakage currents of 4H-SiC MOSFET were measured at different gate voltages and temperatures, which revealed the critical condition of differentiating FN tunneling current from Ohmic current and FP emission. By assuming that the critical conditions indicated the applicable conditions of E model and l/E model, a unified time-dependent-dielectric-breakdown (TDDB) model was proposed, which predicted a TDDB lifetime longer than that of E model, and lower than that of l/E model. Keywords-TDDB lifetime model; FN tunneling; Ohmic current; FP emission; 4H-SiC MOSFETs; E model; l/Emodel
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