{"title":"磁控溅射中膜性再现问题的原因分析","authors":"J. Mwabora, R. Kivaisi","doi":"10.4314/AJST.V1I4.44625","DOIUrl":null,"url":null,"abstract":"Causes of reproducibility problem in thin film deposition using magnetron sputtering have been identified. To remedy this problem, one must calibrate deposition rate after installation of a new target or magnetron and should repeat such calibrations as frequently as possible in order to obtain films with reproducible properties. For magnetrons used in our laboratory to be in working condition, the transverse magnetic field strength on the surface of the magnetron should be about 50 mT or more.","PeriodicalId":7641,"journal":{"name":"African Journal of Science and Technology","volume":"44 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2009-07-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Causes of film property reproducibility problem in magnetron sputtering\",\"authors\":\"J. Mwabora, R. Kivaisi\",\"doi\":\"10.4314/AJST.V1I4.44625\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Causes of reproducibility problem in thin film deposition using magnetron sputtering have been identified. To remedy this problem, one must calibrate deposition rate after installation of a new target or magnetron and should repeat such calibrations as frequently as possible in order to obtain films with reproducible properties. For magnetrons used in our laboratory to be in working condition, the transverse magnetic field strength on the surface of the magnetron should be about 50 mT or more.\",\"PeriodicalId\":7641,\"journal\":{\"name\":\"African Journal of Science and Technology\",\"volume\":\"44 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2009-07-27\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"African Journal of Science and Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.4314/AJST.V1I4.44625\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"African Journal of Science and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.4314/AJST.V1I4.44625","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Causes of film property reproducibility problem in magnetron sputtering
Causes of reproducibility problem in thin film deposition using magnetron sputtering have been identified. To remedy this problem, one must calibrate deposition rate after installation of a new target or magnetron and should repeat such calibrations as frequently as possible in order to obtain films with reproducible properties. For magnetrons used in our laboratory to be in working condition, the transverse magnetic field strength on the surface of the magnetron should be about 50 mT or more.
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