高取向La掺杂(K, Na)NbO3铁电薄膜

X. Vendrell, L. Mestres, O. Raymond, D. A. Ochoa, J. García
{"title":"高取向La掺杂(K, Na)NbO3铁电薄膜","authors":"X. Vendrell, L. Mestres, O. Raymond, D. A. Ochoa, J. García","doi":"10.1109/ISAF.2012.6297793","DOIUrl":null,"url":null,"abstract":"Lead-free (K<sub>0.5</sub>Na<sub>0.5</sub>)<sub>1-3x</sub>La<sub>x</sub>NbO<sub>3</sub> (x = 0.0-0.005) thin films were synthesized by chemical solution deposition. The X-ray analysis showed that (K<sub>0.5</sub>Na<sub>0.5</sub>)NbO<sub>3</sub> (KNN) and La doped KNN single-phase thin films were obtained with a [100] preferred orientation. When doping with La, thin films exhibited a remarkably low leakage current and higher dielectric properties.","PeriodicalId":20497,"journal":{"name":"Proceedings of ISAF-ECAPD-PFM 2012","volume":"37 1","pages":"1-4"},"PeriodicalIF":0.0000,"publicationDate":"2012-07-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Highly oriented La doped (K, Na)NbO3 ferroelectric thin films\",\"authors\":\"X. Vendrell, L. Mestres, O. Raymond, D. A. Ochoa, J. García\",\"doi\":\"10.1109/ISAF.2012.6297793\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Lead-free (K<sub>0.5</sub>Na<sub>0.5</sub>)<sub>1-3x</sub>La<sub>x</sub>NbO<sub>3</sub> (x = 0.0-0.005) thin films were synthesized by chemical solution deposition. The X-ray analysis showed that (K<sub>0.5</sub>Na<sub>0.5</sub>)NbO<sub>3</sub> (KNN) and La doped KNN single-phase thin films were obtained with a [100] preferred orientation. When doping with La, thin films exhibited a remarkably low leakage current and higher dielectric properties.\",\"PeriodicalId\":20497,\"journal\":{\"name\":\"Proceedings of ISAF-ECAPD-PFM 2012\",\"volume\":\"37 1\",\"pages\":\"1-4\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-07-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of ISAF-ECAPD-PFM 2012\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISAF.2012.6297793\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of ISAF-ECAPD-PFM 2012","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISAF.2012.6297793","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

采用化学溶液沉积法合成了无铅(K0.5Na0.5)1-3xLaxNbO3 (x = 0.0-0.005)薄膜。x射线分析表明,(K0.5Na0.5)NbO3 (KNN)和La掺杂的KNN单相薄膜具有[100]择优取向。当掺杂La时,薄膜表现出非常低的漏电流和更高的介电性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Highly oriented La doped (K, Na)NbO3 ferroelectric thin films
Lead-free (K0.5Na0.5)1-3xLaxNbO3 (x = 0.0-0.005) thin films were synthesized by chemical solution deposition. The X-ray analysis showed that (K0.5Na0.5)NbO3 (KNN) and La doped KNN single-phase thin films were obtained with a [100] preferred orientation. When doping with La, thin films exhibited a remarkably low leakage current and higher dielectric properties.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信