p-i-n绝缘体上硅(SOI)相位调制器的自由载流子吸收损耗

H. Haroon, H. Abdul Razak, M. Bidin, S. Shaari, P. Sushita Menon
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引用次数: 12

摘要

硅高速波导集成电光调制器是片上光网络的关键器件之一。该设备将数据从电域转换为光域。大多数关于硅或硅基器件高速调制方法的研究都是基于自由载流子浓度的变化(自由载流子的注入或耗尽),这些变化负责局部折射率的变化,然后导波通过有源区域进行相位调制。通过在硅p-i-n二极管的本征区注入或耗尽电子和空穴,可以实现折射率/吸收的变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Free carrier absorption loss of p-i-n silicon-on-insulator (SOI) phase modulator
Silicon high-speed waveguide-integrated electro-optic modulator is one of the critical devices for on-chip optical networks. The device converts data from electrical domain to the optical domain. Most studies for high speed modulation method in Si or Si based device are based on free carrier concentration variations (injection or depletion of free carriers) which are responsible for local refractive index variations and then phase modulation of a guided wave traveling through the active region. A change in the refractive index/absorption can be achieved by injection or depletion of both electron and holes into the intrinsic region of a silicon p-i-n diode.
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