氢钝化对含硅量子点和不含硅量子点的a-Si/SiNX多层膜光学性能的影响

D. K. Rai, Bikas Ranjan, A. Panchal, K. Balasubramaniam, C. Solanki
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引用次数: 0

摘要

目的是更好地理解具有硅量子点(Si-QDs)的a-Si/SiNX多层材料的光学行为,硅量子点可以用作硅量子点太阳能电池的光吸收材料。本文研究了含Si-QDs和不含Si-QDs的a-Si、SiNX/a-Si、a-Si/SiNX和SiNX/a-Si/SiNX结构薄膜的反射率。含硅量子点或不含硅量子点的薄膜的氢钝化(h -钝化)对薄膜光学性能的影响可以忽略不计。在h钝化前后,有Si-QDs的薄膜在200 ~ 600 nm波长范围内的反射率较无Si-QDs的薄膜低。硅量子点和光的吸收增强是由于硅量子点和量子约束效应(QCE)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of hydrogen passivation on optical properties of a-Si/SiNX multilayered films with Si-QDs and without Si-QDs
The objective is to develop better understanding of the optical behavior of a-Si/SiNX multilayer with silicon quantum dots (Si-QDs) which can be used as light absorber material for Si-QD based solar cells. In this work, reflectance of a-Si, SiNX/a-Si, a-Si/SiNX and SiNX/a-Si/SiNX structured films with Si-QDs and without Si-QDs were examined. Hydrogen passivation (H-passivation) of a film with Si-QDs or without Si-QDs showed negligible effect on the optical property of the film. The films with Si-QDs before and after H-passivation showed low reflectance of light in the wavelength range of 200-600 nm compared to the films without Si-QDs. The enhancement in the absorption of light in the films is attributed to the Si-QDs and the quantum confinement effect (QCE).
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